講演会・セミナー » 第186回 フロンティア材料研究所学術講演会
(Professor Michael Hayward)
第186回 フロンティア材料研究所学術講演会
(Professor Michael Hayward)
開催日時 2024年10月11日 10:30 –12:00
開催場所 東京科学大学(Science Tokyo) すずかけ台キャンパス 大学会館(H2棟) 2 F 集会室1
主催フロンティア材料研究所                     
連絡先東・山本研究室(内線:5315)

プログラム等

第186回 フロンティア材料研究所学術講演会プログラム

講師:  Professor Michael Hayward 
    Inorganic Chemistry Laboratory, University of Oxford

演題:  Low temperature Topochemical Reactions as a Route to Novel Electronic Materials

Abstract:
In a topochemical reaction atoms or ions are inserted into, or extracted from, an existing solid phase, whist retaining the overall crystal structure of the original material As these chemical manipulations are performed under kinetic control, extremely metastable phases can be produced By applying this synthetic strategy to complex transition metal oxides, for example via the low temperature ‘de-intercalation’ of oxide ions with binary metal hydrides (NaH, CaH2, LiH), phases containing transition metal cations with highly unusual combinations of oxidation state and coordination geometry can be prepared (e.g. square-planar Ni1+, Fe2+, Ru2+, Ir2+). Furthermore, these same binary hydrides can also bring about hydride-for-oxide anion exchange reactions, giving access to highly metastable transition-metal oxyhydride phases Recent results studying the topochemical reduction of Ru, Rh and Ir containing phases will be discussed, both in terms of the reactions which occur and the electronic behaviour of the highly reduced oxide and oxyhydride phases produced

 

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