(Excerpt) Equipment Available for Collaborative Research at MSL 2025
| Equipment | Contact person |
| High-pressure synthesis appraratus |
AZUMA Masaki SHIGEMATSU Kei |
| SQUID Magnetometer ( MPMS ; Quantum Design ) | |
| Physical Property Measurement System Under High Magnetic Field | |
| Atomic Force Microscopy System | |
| X-RAY DIFFRACTOMETER | |
| Walker-type high pressure apparatus | |
| High performance liquid chromatography |
HARA Michikazu ISHIKAWA Satoshi HATTORI Masashi |
| Electron Spectroscopy for Chemical Analysis | |
| Infrared Spectrometer | |
| CHN elemental analyzer | |
| Glovebox System | |
| Fourier Transform Infrared Spectroscopy | |
| Experimental Equipment for Non-Structural Components | ISHIHARA Tadashi |
| Capillary gas chromatography |
KAMATA Keigo AIHARA Takeshi |
| Fourier Transform Infrared Spectrometer | |
| UV-Vis Absorption Spectrometer | |
| SQUID Magnetometer ( MPMS ; Quantum Design ) |
KAWAJI Hitoshi KITANI Suguru |
| High-Resolution Solid-State NMR Spectrometer (BRUKER AVANCE III HD) | |
| Single-Crystal Four-Circle Diffractometer | |
| X-ray Powder Diffractometer | |
| 3He-4He Dilution Refrigerator | |
| Heat capacity measurement system using relaxation method | |
| 2000kN Dynamic Loading Actuator |
KISHIKI Shoichi KUROSAWA Miku |
| 200tf Universal Testing Machine | |
| 500kN Temperature Variable High Rigidness Material Testing Machine | |
| Multi-Dimensional Long Stroke Loading System | |
| Reaction Frame (1000kN and 500kN Oil Jacks) | |
| Load & Displacement Control System for Structural Experiments | |
| 1000kN hydraulic jack with 2 directional load cells | |
| 200kN hydraulic jacks | |
| DATA LOGGER TDS630，Tokyo Sokki Kenkyujo | KONO Susumu |
| Servo controlled static hydraulic pump and controlling units | |
| 4MN hydraulic jacks | |
| Concrete cylinder specimen end grinding machine | |
| ”Scanning Electron Microscope” Hitachi Regulus8230 | MAJIMA Yutaka |
| Equipment for single crystals growth | SASAGAWA Takao |
| Equipment for physical properties evaluation under extreme conditions | |
| Maskless Electronic Device Fabrication System |
